Multi-Wavelength Photoluminescence (PL) System MPL-300
1350mm (W) x 2538.5mm (D) x 1960mm (H)
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Two FOUP openers included
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Single Monitor on backside
The MPL-300 system design is based on a micro photoluminescence (PL) measurement technique and WaferMasters' proprietary PL imaging technology. It allows multi-wavelength micro PL spectrum characterization and chip-level PL imaging of Si based materials and devices such as memory devices, CMOS image sensors and solar cells under process. The specially designed, TE cooled IR spectrometer and CCD camera has no moving parts to ensure high measurement accuracy,repeatability and stability. The PL spectra are sequentially measured by changing excitation wavelengths without moving specimen under characterization. This provides depth profiling of the PL spectra and/or image at the same measurement site, providing very accurate, site specific information on the specimen.
Applications
Nondestructive Wafer Characterization and
In-Line Process Monitoring
Customers are strongly encouraged to discuss current
processing problems and new applications with WaferMasters' technical staffs
at our various locations. WaferMasters is willing to assist you to find
simple and natural processing / equipment solutions.
