The
FAS-200 system is designed based on a arc lamp technology
to address USJ implant anneal applications. The system generates
very high intensity lights for a extremely short time, annealing
the USJ implant with a minimal dopant profile change.
Applications
USJ Implant anneal
Key Benefits & Specifications
Simple and Robust Design
Excellent Process Uniformity
& Repeatability
Stable and Reliable
System Performance
Small Footprint
Energy Efficient (Power Consumption
< 5kW / Chamber)
Timely and Cost Effective
Device Manufacturing
Customers are strongly encouraged
to discuss current processing problems and new applications
with WaferMasters' technical staffs at our various locations.
WaferMasters is willing to assist you to find simple
and natural processing / equipment solutions.
