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MINI
BATCH FURNACE
MBF-300 |
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| 1050mm
(W) X 1600mm (D) X 2000mm (H) |
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| The MBF-300 system
is designed based on a resistively heated furnace technology
to enhance lot size flexibility and reduce cycle time for annealing
and LPCVD applications up to 1000°C. The system processes
twenty five wafers per batch and provides excellent process
repeatability and stability in addition to the lot size flexibility. |
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| Applications |
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| Silicidation (TiSi, CoSi, NiSi, WSi etc.) |
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| Implant anneal |
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| Oxidation (Dry & Wet) |
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| Glass reflow |
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| Film Densification |
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| Key Benefits & Specifications |
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| Simple and Robust Design |
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| Excellent Process Uniformity & Repeatability |
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| Stable and Reliable System Performance |
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| Small Footprint |
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| Energy Efficient (Power Consumption < 5kW / Chamber) |
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| Vertically Stacked Dual Process Chambers |
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| Timely and Cost Effective Device Manufacturing |
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| Reduce Capital Investment |
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Customers are strongly encouraged to discuss current
processing problems and new applications with WaferMasters' technical staffs
at our various locations. WaferMasters is willing to assist you to find
simple and natural processing / equipment solutions. |
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